本發明提供一種透明抗電磁波薄膜,包含透明的一第一基板,及一設置於該第一基板上的抗電磁波層體。該抗電磁波層包括一透明導電層,及多條形成於該透明導電層上且彼此間隔的金屬導線,其中,該透明導電層的材料組成包括導電高分子,該第一基板於可見光波長具有一預定的光穿透率,且該抗電磁波層體對該第一基板的光穿透率的改變量小於20%。 This invention provides a transparent EMI shielding thin film, which comprises a first substrate, and an EMI shielding body that disposes on the first substrate. The EMI shielding body includes a transparent conductive layer, and a plurality of discrete metal wires that forms on the transparent conductive layer, wherein the transparent conductive layer includes conductive polymer, and the first substrate contain a predetermined transmittance in visible light wavelengths, such that the EMI shielding body making the change of the predetermined transmittance is less than 20 %. |