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專利授權區
專利名稱(中) 異質結構光電催化劑及其製造方法
專利名稱(英) HETEROSTRUCTURED PHOTOELECTROCATALYST AND METHOD OF FABRICATING THE SAME
專利家族 中華民國:202435965(公開號)
大陸:CN118634840A(公開號)
美國:US20240301574A1(公開號)
專利權人 國立清華大學 100%
發明人 嚴大任,陳君彥,毛敬涵
技術領域 能源科技,光電光學
專利摘要(英)
A heterostructured photoelectrocatalyst and a method of fabricating the same. The heterostructured photoelectrocatalyst according to the invention includes a substrate, a plurality of nanowires, a plurality of metal nanoparticles and a transition metal compound film. The substrate is formed of a semiconductor material with a first conductive type. The plurality of nanowires are formed of the semiconductor material and formed on an upper surface of the substrate. Each nanowire thereon exists a few of the plurality of metal nanoparticles. The transition metal compound film is formed to overlay the plurality of nanowires and the plurality of metal nanoparticles. The transition metal compound film can formed of a transition metal sulfide, a transition metal telluride or a transition metal selenide. The compound film has a second conductive type different from the first conductive type.
聯絡資訊
承辦人姓名 楊美茹
承辦人電話 03-5715131 #62305
承辦人Email mjyang2@mx.nthu.edu.tw
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