專利授權區 | |
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專利名稱(英) | VAPOR CHAMBER DEVICE |
專利家族 |
中華民國:I842472 日本:7571211 歐盟:4446684(公開號) 美國:US-2024-0344773-A1(公開號) |
專利權人 | 國立清華大學 100% ,國立清華大學 100% |
發明人 | 王訓忠 |
技術領域 | 能源科技,機械結構,電子電機 |
專利摘要(英) |
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A vapor chamber device (100, 100d, 100e, 100g, 100h, 100i) includes a first casing (110, 110e, 110f, 110h), a first capillary structure (130), and a second casing (120, 120a, 120b, 120c, 120h). The first casing (110, 110e, 110f, 110h) includes a first plate portion (111), multiple first protrusions (117a, 117d, 117e, 117f), and a first side wall (117). The first capillary structure (130) is disposed above an inner surface (1112) of the first plate portion (111) and surrounds the first protrusions (117a, 117d, 117e, 117f). The second casing (120, 120a, 120b, 120c, 120h) is stacked on the first casing (110, 110e, 110f, 110h), and the second casing (120, 120a, 120b, 120c, 120h) includes a second plate portion (121), multiple second protrusions (122, 122a, 122b), and a second side wall (128). The first side wall (117) is connected to the second side wall (128), and multiple steam passages (124) are formed between the second protrusions (122, 122a, 122b). The second plate portion (121) includes multiple connecting regions (129) yielded by the second protrusions (122, 122a, 122b), and the first protrusions (117a, 117d, 117e, 117f) are connected to the connecting regions (129). The second protrusions (122, 122a, 122b) rest against the first capillary structure (130). |
聯絡資訊 | |
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承辦人姓名 | 劉千綺 |
承辦人電話 | 03-571-5131 #31181 |
承辦人Email | chienchi@mx.nthu.edu.tw |