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專利授權區

專利授權區
專利名稱(中)	原子力顯微鏡乾燥系統及原子力顯微鏡
專利名稱(英)	ATOMIC FORCE MICROSCOPE DRYING SYSTEM AND ATOMIC FORCE MICROSCOPE
專利家族	美國：9442132 B2
專利權人	國立清華大學 100%
發明人	張佐民,曾繁根
技術領域	機械結構,光電光學

專利摘要(中)
A drying system, which can be implemented in an atomic force microscopy (AFM) machine according to the invention, includes an elastomer having elasticity and disposed between an AFM scan head device and a platen to form a chamber. A sample supporting substrate is disposed in the chamber and for placement of a specimen. A gas inlet pipeline extends from an outside of the chamber to an inside of the chamber to introduce a drying gas into the chamber. A gas outlet pipeline extends from the inside of the chamber to the outside of the chamber to exhaust the drying gas out of the chamber. Using the mechanism of introducing and exhausting the drying gas can exhaust the moisture out of the chamber, so that the relative humidity (RH) is decreased below 5％ and a constant internal pressure is held in the space to become stable.

專利摘要(中)

A drying system, which can be implemented in an atomic force microscopy (AFM) machine according to the invention, includes an elastomer having elasticity and disposed between an AFM scan head device and a platen to form a chamber. A sample supporting substrate is disposed in the chamber and for placement of a specimen. A gas inlet pipeline extends from an outside of the chamber to an inside of the chamber to introduce a drying gas into the chamber. A gas outlet pipeline extends from the inside of the chamber to the outside of the chamber to exhaust the drying gas out of the chamber. Using the mechanism of introducing and exhausting the drying gas can exhaust the moisture out of the chamber, so that the relative humidity (RH) is decreased below 5％ and a constant internal pressure is held in the space to become stable.

聯絡資訊
承辦人姓名	楊美茹
承辦人電話	03-5715131 #62305
承辦人Email	mjyang2@mx.nthu.edu.tw