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專利授權區

專利授權區
專利名稱(中)	黃光製程產能規劃系統及其規劃方法
專利名稱(英)	PHOTOLITHOGRAPHY CAPACITY PLANNING SYSTEM AND NON-TRANSITORY COMPUTER READABLE MEDIA THEREOF
專利家族	中華民國：I529633 美國：8,863,047
專利權人	國立清華大學 100.00%
發明人	吳吉政,簡禎富
技術領域	工業工程,電子電機

專利摘要(中)
The present invention relates to a photolithography capacity planning system and a non-transitory computer readable media thereof. The photolithography capacity planning system includes a cost calculation module, a capacity calculation module, a demand calculation module, and a data processing module. The cost calculation module calculates a production cost, an unfulfilled demand cost, and a mask cost of the photolithography manufacturing process. The capacity calculation module calculates a capacity of light sources, a capacity of shared equipments, and a capacity of specified equipments of the photolithography manufacturing process. The demand calculation module calculates a quantity of unfulfilled demand. The data processing module produces a planning result.

專利摘要(中)

The present invention relates to a photolithography capacity planning system and a non-transitory computer readable media thereof. The photolithography capacity planning system includes a cost calculation module, a capacity calculation module, a demand calculation module, and a data processing module. The cost calculation module calculates a production cost, an unfulfilled demand cost, and a mask cost of the photolithography manufacturing process. The capacity calculation module calculates a capacity of light sources, a capacity of shared equipments, and a capacity of specified equipments of the photolithography manufacturing process. The demand calculation module calculates a quantity of unfulfilled demand. The data processing module produces a planning result.

聯絡資訊
承辦人姓名	李佳玲
承辦人電話	03-5715131 #62300
承辦人Email	cl.lee@mx.nthu.edu.tw