The present invention discloses a lead-free metallic halide memristor, comprising: a first electrode layer, an active layer and a second electrode layer. In which, the active layer is formed on the first electrode layer, and the second electrode layer is formed on the active layer. Experimental data have proved that, the lead-free metallic halide memristor includes synaptic plasticity because of showing characteristics of short-term potentiation (STP), short-term depression (STD), long-term potentiation (LTP), long-term depression (LTD) during the experiments. Therefore, the lead-free metallic halide memristor has significant potential for being used as an artificial synaptic device so as to be further applied in the manufacture of a Neuromorphic computing chip. Moreover, experimental data have also proved that, the lead-free metallic halide memristor shows the characteristics of multi-level resistive switching, such that the lead-free metallic halide memristor can also be used as non-volatile memory so as to be further applied in the manufacture of a reservoir computing chip. |