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專利授權區
專利名稱(英)	LAYER BY LAYER REMOVAL OF GRAPHENE LAYERS
專利家族	中華民國：I531532 美國：9,183,971
專利權人	國立清華大學 100%
發明人	許瑋仁,鄧博元,邱博文,陳宛楨
技術領域	材料化工,光電光學,電子電機

專利摘要(英)
A method for controllable layer-by-layer removal of graphene layers is provided. The method includes the steps of: disposing a single-layer or multi-layer graphene on a heat source, arranging graphene layer or layers in a sealed chamber filled with ozone gas, and removing a targeted area of graphene with a laser. The method provides low-temperature removal of graphene layer-by-layer. The heat source, laser, and the highly oxidizing ozone gas selectively control the removal of graphene layers.

專利摘要(英)

A method for controllable layer-by-layer removal of graphene layers is provided. The method includes the steps of: disposing a single-layer or multi-layer graphene on a heat source, arranging graphene layer or layers in a sealed chamber filled with ozone gas, and removing a targeted area of graphene with a laser. The method provides low-temperature removal of graphene layer-by-layer. The heat source, laser, and the highly oxidizing ozone gas selectively control the removal of graphene layers.

聯絡資訊
承辦人姓名	李曉琪
承辦人電話	03-5715131 #31061
承辦人Email	hsiaochi@mx.nthu.edu.tw