專利授權區國立清華大學國際產學營運總中心 Operations Center for Industry Collaboration

搜尋專利授權區

關鍵字

» 新增關鍵字

選單

專利授權區

專利授權區
專利名稱(英)	PHOTOLITHOGRAPH APPARATUS, METHOD FOR INSPECTING PARTICLES AND SEMICONDUCTOR PROCESS
專利家族	中華民國：202503417(公開號) 美國：2025-0020570(公開號)
專利權人	國立清華大學 100.00%
發明人	林本堅,高蔡勝,陳柏熊,呂柏勳,羅孟承
技術領域	光電光學,電子電機

專利摘要(英)
A method for inspecting particles is suitable for inspecting particles on a substrate. The method for inspecting the particles includes the following. The substrate is disposed on a stage. An inspection radiation is provided to irradiate on the substrate, in which the inspection radiation is suitable for exciting the particles on the substrate to emit a secondary radiation. Also, the secondary radiation is detected to confirm whether the particles exist on the substrate and positions of the particles are detected.

專利摘要(英)

A method for inspecting particles is suitable for inspecting particles on a substrate. The method for inspecting the particles includes the following. The substrate is disposed on a stage. An inspection radiation is provided to irradiate on the substrate, in which the inspection radiation is suitable for exciting the particles on the substrate to emit a secondary radiation. Also, the secondary radiation is detected to confirm whether the particles exist on the substrate and positions of the particles are detected.

聯絡資訊
承辦人姓名	李曉琪
承辦人電話	03-5715131 #31061
承辦人Email	hsiaochi@mx.nthu.edu.tw