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專利授權區
專利名稱(中)	具有結晶矽薄膜之基板及其製備方法
專利名稱(英)	SUBSTRATE WITH CRYSTALLIZED SILICON FILM AND MANUFACTURING METHOD THEROF
專利家族	中華民國：I519668 美國：9,443,924
專利權人	國立清華大學 100%
發明人	李紫原,謝秉諺,戴念華
技術領域	材料化工,光電光學,電子電機

專利摘要(中)
The present invention relates to a substrate with a crystallized silicon film and manufacturing method thereof, wherein the substrate with the crystallized silicon film comprises: a substrate, which is a polymer substrate; and a crystallized silicon film, which is formed on at least one surface of the substrate, wherein the crystallized silicon film comprises a plurality of silicon crystals with column structures, and the crystallinity of the crystallized silicon film is higher than 90％.

專利摘要(中)

The present invention relates to a substrate with a crystallized silicon film and manufacturing method thereof, wherein the substrate with the crystallized silicon film comprises: a substrate, which is a polymer substrate; and a crystallized silicon film, which is formed on at least one surface of the substrate, wherein the crystallized silicon film comprises a plurality of silicon crystals with column structures, and the crystallinity of the crystallized silicon film is higher than 90％.

聯絡資訊
承辦人姓名	楊美茹
承辦人電話	03-5715131 #62305
承辦人Email	mjyang2@mx.nthu.edu.tw